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A silicon-based MOSFET has a square gate 0.50μmon edge. The insulating silicon oxide layer that separates the gate from the p-type substrate is 0.20μmthick and has a dielectric constant of 4.5 . (a) What is the equivalent gate – substrate capacitance (treating the gate as one plate and the substrate as the other plate)? (b) Approximately how many elementary charges eappear in the gate when there is a gate – source potential difference of 1.0V ?

Short Answer

Expert verified
  1. The equivalent gate-substrate capacitance is 5.0×10-17F.
  2. The number of elementary charges appearing in the gate when there is a gate-source potential difference of is 31×102.

Step by step solution

01

The given data

  1. The dimension of the square gate of the MOSFET,a=0.50μm
  2. The thickness of the insulating layer separating the gate from the p-type substrate,d=0.20μm
  3. Dielectric constant of the layer, k=4.5
  4. Source potential difference,V=1.0V
02

Understanding the concept of capacitance and charge

Capacitance is the ability of any conductor to store charge. It is described as the amount of charge stored per unit change in potential difference.

Formulae:

The capacitance between two plates of the capacitor,C=kε0Ad (i)

The charge between the capacitor plates,q=CV (ii)

The number of elementary charges in the layer,N=q/e (iii)

Here, A is the cross-sectional area of the plate, d is the distance between the plates, V is the potential difference between the plates, q is the charge stored and ؏0 is the permittivity of free space.

03

a) Calculation of the value of the capacitance

Area of the square gate is given by:

A=a2=0.50μm2

Using the given data in equation (i), we can get the capacitance value of the equivalent gate-substrate as follows:

C=4.58.85×10-12F/m0.50μm20.20μm=5.0×10-17F

Hence, the value of the capacitance is 5.0×10-17F.

04

b) Calculation of the number of elementary charges

Using equation (ii) and equation (ii), we can get the number of the elementary charge particles appearing in the gate, as follows:

N=CVe=5.0×10-17F1.0V1.6×10-19C=3.1×102

Hence, the number of the charges is 3.1×102.

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Most popular questions from this chapter

A potassium chloride crystal has an energy band gap of 7.6eV above the topmost occupied band, which is full. Is this crystal opaque or transparent to light of wavelength 140 nm?

Calculate N0(E)the density of occupied states, for copper at 10000K for energy Eof (a)4.00eV , (b) 6.75eV, (c) 7.00eV, (d) 7.25eV, and (e) 9.00eV. Compare your results with the graph of Fig. 41-8b.The Fermi energy for copper is 7.00eV.

The occupancy probability function (Eq. 41-6) can be applied to semiconductors as well as to metals. In semiconductors the Fermi energy is close to the midpoint of the gap between the valence band and the conduction band. For germanium, the gap width is 0.67eV. What is the probability that (a) a state at the bottom of the conduction band is occupied and (b) a state at the top of the valence band is not occupied? Assume that T = 290K. (Note:In a pure semiconductor, the Fermi energy lies symmetrically between the population of conduction electrons and the population of holes and thus is at the center of the gap. There need not be an available state at the location of the Fermi energy.)

Use the result of Problem 23 to calculate the total translational kinetic energy of the conduction electrons in 1.00cm3 of copper at T = 0K.

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