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Name the two most common types of SPMs.

(a) How do they differ?

(b) What are the advantages of each type?

(c) What are the major limitations of each type?

Short Answer

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A scanning tunneling microscope (STM) is a device that produces images of atoms on material surfaces. The STM is not an optical microscope; instead, it detects electrical forces using a probe that tapers down to a single atom in diameter.

Step by step solution

01

(a) Scanning Tunneling Microscope 

A scanning tunneling microscope (STM) uses an extremely tiny metallic tip to scan the sample surface in a raster pattern.
It is based on the quantum mechanical tunneling theory.
The tunneling current (It)controls the location of the tip above the surface.
It=Ve-Cdis the magnitude of the tunneling current, where V is the bias voltage, C is a constant, and d is the distance between the probe and the surface.
The sample surface is scanned in a raster pattern with the help of a flexible force-sensing cantilever stylus in an atomic force microscope (AFM).
The sensor in this microscope is in contact with the sample's surface.
02

(b) Advantage  of STM

The scanning tunneling microscope's (STM) advantage is that the tip never comes into contact with the sample's surface, ensuring that the sample's surface is never harmed or altered.

The atomic force microscope (AFM) has the advantage of allowing the sample surface to be either an electrical conductor or an insulator.

03

Limitation of STM 

The scanning tunneling microscope (STM) is limited by the need that the sample surface be an electrical conductor.

The sensor of an atomic force microscope (AFM) comes into contact with the sample surface, which might modify the properties of the sample surface.

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Most popular questions from this chapter

Describe how it is possible to distinguish between XPS peaks and Auger electron peaks.

Quantitative X-ray photo electron spectrometry has become more popular in recent years. The factors relating the intensity of emission to atomic concentration (density) are given in Equation 21-3.

(a) Of the factors influencing the emission intensity, identify those related to the analyte.
(b) Identify the factors influencing the emission intensity related to the spectrometer.

(c) The measured quantity in quantitative XPS is usually I/S, where Iis the peak area andSis the sensitivity factor for the element of interest. If this quantity is measured for the analyte (I/S)aand the corresponding value measured for an internal standard with a different transition (I/S)s, show by means of an equation how the ratio (I/S)a/(I/S)s is related to the atomic concentration ratio of the analyte to the internal standard.
(d) If all the elements on a surface are measured by XPS, show that the fractional atomic concentration fAof element A is given by
fA=IA/SAโˆ‘In/Sn
where Inis the measured peak area for element n,Snis the atomic sensitivity factor for that peak, and the summation is carried out over all n.

(e) For a polyurethane sample in which carbon, nitrogen, and oxygen were detected by XPS, the sensitivity factor for Cwas 0.25on the spectrometer used. The sensitivity factor for Nwas 0.42and that for Owas 0.66on the same spectrometer. If the peak areas were C(1s)=26,550, N(1s)=4475, and O(1s)=13,222 what were the atomic concentrations of the three elements?
(f) What are the limitations of quantitative analysis with XPS? Why might the atomic concentrations measured not correspond to the bulk composition?
(g) For polyurethane, the stoichiometric atomic concentrations are C=76.0%, N=8.0%, and O=16.0%. Calculate the percentage error in the values obtained in part (e) for each element.

Describe the mechanism of the production of an LMM Auger electron.

Describe the mechanism of the production of an LMM Auger electron.

If the tunneling current is 8.7pmwhen an STM probe is 0.40nm from a surface and 17.0pAwhen the probe is 0.50nmfrom the surface, calculate the current on moving the tip in 0.10nmsteps from 0.40nm to 1.50nm.

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