Doping is a process that enhances the electrical conductivity of semiconductors by introducing impurities. This is achieved by adding atoms with more or fewer electrons than the semiconductor itself.
- N-Type Doping: This involves adding donor atoms, often from group V of the periodic table, like phosphorus. These atoms have one more electron than the semiconductor's atoms, providing extra electrons that can move into the conduction band, making the material more conductive. However, because these electrons occupy the anti-bonding conduction band, they can weaken the internal bond structure.
- P-Type Doping: Here, acceptor atoms from group III, like boron, are used. These have one less electron, creating holes in the valence band. These holes can "accept" electrons from neighboring atoms, effectively allowing new bonds to form and thus strengthen the overall bonding framework of the semiconductor.
Both types of doping are essential when tailoring semiconductors for particular applications in electronics, like transistors and diodes. By carefully selecting doping elements, engineers can control the electrical properties and optimize the material for specific functions.